Identifying the origin of a plating deficiency is the first step toward solving
the problem. The source of poor plating can be divided into three categories:
1) Defective bath chemistry; 2) Improper temperature and/or current density;
and 3) Poorly finished and/or cleaned substrates. An experienced plater can
often identify the source of a problem without having to do much detective work;
however, chemical analysis, Hull cell tests and reliable supplier recommendations
are the best troubleshooting sources. The most common defects for hexavalent
chromium plating deposits are listed here, along with some suggested solutions.
Despite the simplicity of their formulations, chromium plating baths are more
complicated to operate than most plating baths and require more rigorous controls.
| TROUBLESHOOTING HEXAVALENT CHROMIUM PLATING |
| Problem |
|
| Milky Deposit |
| High chromic acid/sulfuric
ratio |
increase sulfate |
| Chloride contamination |
remove chloride
with silver carbonate |
| Iron contamination |
dilute bath |
| Excess trivalent
chromium |
clean anodes; reoxidize
trivalent chromium |
| Poor nickel surface |
carbon treat nickel,
improve rinsing of nickel, use nickel activator |
| High temperature |
reduce to normal,
check controller |
|
| Hazy
Deposit |
| High
chromic acid/sulfate ratio |
increase sulfate |
| High chloride
contamination |
remove chloride
with silver carbonate |
| Iron contamination |
dilute bath |
| Excess trivalent
chromium |
clean anodes; reoxidize
trivalent chromium |
| Low
temperature |
increase to normal |
| Current density
too high |
adjust anode-to-cathode
ratio |
| Intermittent current
flow |
check electrical
contacts |
| Poor nickel surface |
improve rinsing
and use nickel activator |
|
| Gray,
Dull but Smooth Deposit |
| High
chromic acid/sulfate ratio |
increase sulfate |
| Current
surge when contact made |
reduce current |
| High temperature |
check temperature
controllers |
|
| Dull
Spots in High-Current Density Areas |
| High
chromic acid/sulfate ratio |
increase sulfate |
| Passive
nickel |
improve rinsing;
use nickel activator |
| Bipolar condition |
Use live entry to
chromium bath |
|
| Blue
Deposits |
| High
temperature |
reduce
temperature to normal |
|
| Rough
Deposits |
| Low
sulfate |
add
sulfuric acid |
| Low
temperature |
adjust temperature
to normal |
| Surface preparation |
improve cleaning/rinsing |
| Suspended particles
in bath |
filter bath/eliminate
source |
|
| Burned
Deposits |
| High
chromic acid/sulfate ratio |
increase
sulfate |
| Low
chromic acid |
add chromium salts |
| Excess trivalent
chromium |
clean anodes/reoxidize
trivalent chromium |
| Too high current
density |
reduce current density
or increase temperature |
| Low temperature |
increase temperature/preheat
large, cold parts |
|
| Brown
Spots or Rainbows |
| Low
sulfate or catalyst |
increase
sulfate concentration/submit samples for analysis |
| Inefficient
contacts |
check racks for
buildup on hooks/tip, check for proper
contacts on buss bars |
|
| Poor
Adhesion |
| Insufficient
etch |
increase
etch time/check etch bath |
| Surface
contamination |
improve rinsing
and/or cleaning cycle |
| Intermittent contact |
clean/check contacts
and put work in the chromium bath live |
| Poor nickel deposit |
check surface prep
before nickel plating and nickel bath |
|
| Poor
Coverage |
| Low
chromic acid content |
Add
chromium salts |
| Low
chromic acid/sulfate ratio |
precipitate excess
sulfate with barium carbonate |
| Plating current
too low |
raise current density |
| Oxidized contact |
clean contacts |
| Scaled anodes |
clean anodes |
| High temperature |
reduce to normal |
| Passive nickel |
activate nickel
surface |
|
| Slow
Deposition Rates |
| High
chromic acid/sulfate ratio |
Add
sulfuric acid |
| Too
low current density |
Increase voltage;
check part distribution and for current leaks |
| Scaled anodes |
clean anodes |
| Oxidized contacts |
clean contacts |
| Insufficient power
supply |
increase rectifier
size |
| Iron contamination |
dilute bath |
| Excess trivalent
chromium |
follow procedure
for reoxidation of trivalent chromium |
| Too high temperature |
reduce to normal |
|
| Partial
Deposition Rates |
| Too
low current density |
increase
voltage; clean rack contacts and anodes |
| Uneven
current density |
Improve part arrangement
on racks |
| Passive nickel |
activate cathodically
or immerse in 50% hydrochloric acid |
| Gas pockets |
Suspend parts so
gas escapes |
|
| No
Deposit |
| Reverse
polarity |
make
proper connections |
| Defective
contacts |
clean contacts |
| Excess
sulfate |
check ratio and
correct |
| Chloride contamination |
remove chloride
with silver carbonate |
|
| Pitted
Deposits |
| Pitted
nickel deposit |
filter
nickel bath |
| Pitting
in base metal |
Improve preparation |
| Solution
contamination from magnetic particles on ground surfaces |
improves grinding
andcleaning procedure |
| Gas pitting |
reposition work on racks
|
|