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The PE-100 Convertible plasma system from Plasma Etch incorporates both RIE anisotropic etching and isotropic etching/cleaning technologies into one stand-alone plasma etching/cleaning system. Users can switch back and forth between modes.
The system is suited for R&D, medical devices, solar cells, optics, printed circuit boards, MEMs, nanotechnology, life sciences, wafer level packaging and laboratory applications, as well as other related semiconductor processes.
