Nanocrystals Technology Used to Develop Hard Mask

Pixelligent has combined its nanocrystal and dispersion technologies with polymer technology from Brewer Science to create a spin-on hard mask designed for semiconductor lithography processes.

Pixelligent has combined its nanocrystal and dispersion technologies with polymer technology from Brewer Science to create a spin-on hard mask designed for semiconductor lithography processes. When commercialized, the hard mask will be available in Brewer Science’s OptiStack system of lithography solutions.

The hard mask is designed to improve the process window while reducing line collapse, improving etch selectivity and offering broad resist compatibility. It was developed by the two companies with support from an award from the U.S. Department of Commerce’s National Institute of Standards and Technology.