The Allied Signal Substrate Technology and Interconnects Division of Honeywell Corp. was a conventional printed circuit board manufacturing facility. In 1997, it introduced a new product, flexible integrated circuits. These flexible integrated circuit boards are used in all types of consumer products, including cellular telephones and wireless hand-held and communication devices.
Although the new product would be similar to circuit boards, the manufacturing process would require clean-room environments with 100,000 and 1,000 ratings and high-purity rinse water of 10 to 12 mega ohms. Also, the rinse water flow would be much higher per rinse tank than previous levels. The requirement of high flow rates motivated the Process Engineering Department to recycle most of the water to reduce sewer connection charges and reduce waste treatment operating costs.
A new facility was built in Costa Mesa, CA for manufacturing the new product. Honeywell decided to invest in the new project because it was a new and growing market with high growth and earnings potential.
The Challenge
The composition of the waste streams was expected to be similar to any printed circuit board shop. The total flow rate was expected to be 125 gpm. This flow rate was a cause for concern for the company's engineers, since the regenerant concentrate from a conventional ion exchange recycling system would yield approximately 6,000- 9,000 gpd of waste.
"According to Vijay Desai, engineer at Honeywell, a large batch treatment system to treat the regenerant waste was unfeasible due to space constraints at the plant site. Moreover, any ion exchange system that created a large regenerant waste volume would not allow us to eliminate the sewer connection in the future."
TABLE I—PCB Water Treatment System Overview |
Streams
Unit Operations (125 gpm metal bearing)
Unit Operations
Recycle Metal Bearing
Regenerant
Footprint |
Photoresist bearing (30 gpm) Metal bearing (125 gpm)
Filtration Oil and grease removal Surfactant and light organic removal Dissolved metal salt removal Ultraviolet polish
pH adjust Detackify Filter press
>99%
Batch treated, discharged
48 × 25 ft inside the pit with same dimensions above. Above the pit includes feed tank, HCl and NaOH reuse tanks, two 2,000 gal batch tanks |
In addition to treatment of the company's metal-bearing rinses, the company's engineers also wanted to treat the photoresist from the operations. Circuit board shops typically do not treat these streams, as they do not contain any toxic or regulated chemicals. Also, since these streams have high levels of organics, recycling them is not attempted. "Honeywell removes the photoresists using conventional chemical treatment and a decision is made based on a bench scale test as to whether or not a detackifier is used," noted Mr. Desai.
The first stage would be to treat the streams and discharge to sewer, once the treatment process was established, the treated streams would be combined with the other streams and recycled.
The streams were segregated as follows:
- Developer stripper rinses to be treated for photoresist removal;
- Tin-lead rinses to be pretreated for lead removal; and
-
All other rinses.
The Solution
The Hydromatix 786 System was selected based on the small volume of residual waste projected. For the 125 gpm flow rate and capacity, the system only generated 700-900 gpd of waste. This was 90% less than conventional technology. The system is designed to reuse rinse water from prior regenerations; minimizing generation of the regenerant waste. Therefore, a 1,500-gal batch treatment unit could be installed to handle this small volume as well as the periodic concentrated bath dumps. The system has been operating efficiently for more than a year.
Making Through-Holes Conductive
Direct metallization has been gaining attention in the printed wiring board (PWB) industry as an environmentally preferable alternative to electroless copper. The EPA has developed a guide that provides first-hand accounts of the problems, solutions, time and effort involved in implementing alternative technologies. The guide discusses carbon, graphite, palladium and conductive polymer technologies in detail. Highlights of each technology will be presented in this sidebar.
Carbon Method
In a carbon process, a conductive layer of carbon black particles is deposited onto the substrate surface and the through-holes. A typical carbon process has six chemical process steps: cleaner, carbon black, conditioner, carbon black, microetch and anti-tarnish.
For this guide, two facilities were interviewed about their experiences with the carbon method. Both process primarily multilayer boards, and both process boards with up to 16 layers and with aspect ratios of 8:1. The facilities switched to the carbon method to reduce cycle time, reduce waste treatment, decrease maintenance requirements and widen the process window.
The first facility, A, experienced few problems. Facility B, however, experienced several equipment-related problems, including difficulties with the pumps, cooling coils, chiller and air knives. Facility B had no problems with the chemistry.
Both facilities have noted benefits over electroless copper. For example, the electroless copper line at Facility B took 1.5 hours to get the first product through after running a load of dummies. After startup, the line could process approximately 60 panels per hour. The carbon system required only 6 minutes to get the first panel through, dummies were not required and product can be processed at 75 panels per hour.
Graphite Methods
Graphite methods disperse graphite (another form of carbon) onto the substrate. Similar to the carbon method, the conditioner solution creates a positive charge on the substrate surface, including the through-holes. Graphite particles are adsorbed onto the exposed surfaces. In contrast to the amorphous structure of the carbon black crystallites, graphite is a three-dimensional polymer that creates a conductive layer that covers both the copper and nonconductive surfaces of the outside layer and interconnects. A typical process has three or four steps: cleaner/conditioner, graphite, fixer (optional) and microetch.
Two PWB facilities were interviewed for this report. The facilities installed the system to eliminate formaldehyde, lower operating costs, improve worker safety, consume less water and reduce cycle time.
Again, equipment problems outweighed chemistry problems. Moreover, one facility said that it now spends more time on equipment maintenance with the graphite process. However, both companies report reduced cycle time and reduced water use.
Palladium Methods
Palladium systems use palladium particles to catalyze nonconductive surfaces of the through-holes. Palladium particles tend to cluster unless they are stabilized through the formation of a colloid that surrounds the individual palladium particles with a protective layer. The two main stabilizers are organic polymer and tin. A typical process has six chemical steps: cleaner/conditioner, microetch, predip, catalyst/conductor, accelerator/postdip and acid dip.
Because five companies were interviewed for the study, this sidebar will not go into any extensive detail. The reasons the facilities switched included elimination of formaldehyde, ease of conversion, reduced labor and material costs, decreased water use, ability to run a variety of substrates, quicker throughput, worker safety and ease of waste treatment.
The companies did report an increase in production throughput, some even tripling productivity. Time required for lab analysis also decreased at all the facilities.
Conductive Polymer Methods
This process deposits a conductive polymer layer on the substrate of the hole. A cleaner/conditioner step coats the glass and epoxy surfaces in the through-holes with a water-soluble organic film. A permanganate catalyst solution deposits manganese dioxide on the organic film. This only occurs on the film-coated glass and epoxy surfaces. Polymerization occurs when a conductive polymer solution containing the pyrrole monomer is applied to the surfaced coating with the manganese dioxide. The polymerization continues until all of the manganese oxidant is consumed, resulting in a layer of conductive polymer that coats the through-holes, which are then flash plated with copper. The process has six steps: microetch, cleaner/conditioner, catalyst, conductive polymer, microetch and copper flash.
This process was primarily introduced in Europe, and only one unit is operating in the U.S. It is available only as a conveyorized plating unit. The volatility of the conductive polymer precludes it use in an open system, because it would deposit a black coating on the surrounding area. Facilities using this process typically produce high volumes of FR-4 boards with 4, 6 or 8 layers for the consumer electronic and communications industries.
Lessons Learned
No matter what the technology, some common suggestions emerged from the experience for successfully implementing an alternative technology. High quality equipment for conveyorized systems is extremely important. Since there can be major differences between direct metallization and electroless copper processes, line operators need to be willing to accept changes and retraining. Facilities should take a "whole-process" view of the technology installation. Process changes upstream and/or down may be necessary to optimize the alternative process. Nevertheless, the most important factor may be a strong commitment from management and line operators to the new technology.
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